发明名称 SEMIPOLAR NITRIDE-BASED DEVICES ON PARTIALLY OR FULLY RELAXED ALLOYS WITH MISFIT DISLOCATIONS AT THE HETEROINTERFACE
摘要 <p>A dislocation-free high quality template with relaxed lattice constant, fabricated by spatially restricting misfit dislocation(s) around heterointerfaces. This can be used as a template layer for high In composition devices. Specifically, the present invention prepares high quality InGaN templates (In composition is around 5-10%), and can grow much higher In-composition InGaN quantum wells (QWs) (or multi quantum wells (MQWs)) on these templates than would otherwise be possible.</p>
申请公布号 KR20120055709(A) 申请公布日期 2012.05.31
申请号 KR20127007354 申请日期 2010.08.23
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 OHTA HIROAKI;WU FENG;TYAGI ANURAG;CHAKRABORTY ARPAN;SPECK JAMES S.;DENBAARS STEVEN P.;NAKAMURA SHUJI;YOUNG ERIN C.
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址