发明名称 URETHANE RESIN COMPOSITION FOR WET FILM FORMATION, POROUS BODY AND POLISHING PAD OBTAINED USING THE RESIN COMPOSITION, AND METHODS OF MANUFACTURING THEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a urethane resin composition which can form a porous body which has outstanding flexibility, a characteristics in which a hole can recover in an original shape and size when released from pressure, and durability of a level which can maintain the characteristic even if being unattended for a fixed period under wet heat environment, and which is suitable for processing by a wet film formation method chiefly. <P>SOLUTION: The urethane resin composition for wet film formation includes: a urethane resin (A) which is obtained by reacting a polyol containing an aliphatic polyester polyol (a1) with a polyisocyanate (a2) containing an aromatic polyisocyanate; a carbodiimide compound (B); and an organic solvent (C), wherein the carbodiimide compound (B) is included in a range of 0.1-5 pts.mass based on 100 pts.mass of the urethane resin (A). In addition, the porous body, the polishing pad, and the methods of manufacturing them are disclosed. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012102182(A) 申请公布日期 2012.05.31
申请号 JP20100249681 申请日期 2010.11.08
申请人 DIC CORP 发明人 KUNO SHINYA;TAKEUCHI HIDEYUKI
分类号 C08L75/06;B24B37/24;C08G18/42;C08K5/29;C09D7/12;C09D175/06 主分类号 C08L75/06
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