发明名称 EXTENDED REACTOR ASSEMBLY WITH MULTIPLE SECTIONS FOR PERFORMING ATOMIC LAYER DEPOSITION ON LARGE SUBSTRATE
摘要 <p>An elongated reactor assembly in a deposition device for performing atomic layer deposition (ALD) on a large substrate. The elongated reactor assembly includes one or more injectors and/or radical reactors. Each injector or radical reactor injects a gas or radicals onto the substrate as the substrate passes the injector or radical reactor as part of the ALD process. Each injector or radical reactor includes a plurality of sections where at least two sections have different cross sectional configurations. By providing different sections in the injector or radical reactor, the injector or radical reactor may inject the gas or the radicals more uniformly over the substrate. Each injector or radical reactor may include more than one outlet for discharging excess gas or radicals outside the deposition device.</p>
申请公布号 WO2012071195(A1) 申请公布日期 2012.05.31
申请号 WO2011US60474 申请日期 2011.11.11
申请人 SYNOS TECHNOLOGY, INC.;LEE, SANG, IN 发明人 LEE, SANG, IN
分类号 C23C16/00 主分类号 C23C16/00
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