发明名称 |
LITHOGRAPHIC APPARATUS FOR TRANSFERRING PATTERN FROM PATTERNING DEVICE ONTO SUBSTRATE, AND DAMPING METHOD |
摘要 |
<p>The invention relates to a lithographic apparatus including a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.FIG 2</p> |
申请公布号 |
SG180091(A1) |
申请公布日期 |
2012.05.30 |
申请号 |
SG20110073129 |
申请日期 |
2011.10.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BUTLER, HANS;OUDE NIJHUIS, MARCO, HENDRIKUS, HERMANUS |
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