发明名称 |
Optical element and exposure apparatus |
摘要 |
An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system. |
申请公布号 |
US8189170(B2) |
申请公布日期 |
2012.05.29 |
申请号 |
US20100659121 |
申请日期 |
2010.02.25 |
申请人 |
SHIRAI TAKESHI;KOKUBUN TAKAO;ISHIZAWA HITOSHI;MURAKAMI ATSUNOBU;NIKON CORPORATION |
发明人 |
SHIRAI TAKESHI;KOKUBUN TAKAO;ISHIZAWA HITOSHI;MURAKAMI ATSUNOBU |
分类号 |
G03B27/42;G02B7/02;G02B13/00;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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