发明名称 |
Interior antenna for substrate processing chamber |
摘要 |
An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal. |
申请公布号 |
US8187416(B2) |
申请公布日期 |
2012.05.29 |
申请号 |
US20050134033 |
申请日期 |
2005.05.20 |
申请人 |
MILLER KEITH A.;XU GENHUA;ZHONG SHENGDE;LOKHANDE MAHENDRA BHAGWAT;APPLIED MATERIALS, INC. |
发明人 |
MILLER KEITH A.;XU GENHUA;ZHONG SHENGDE;LOKHANDE MAHENDRA BHAGWAT |
分类号 |
C23C16/00;H01L21/306;H04N5/44;H04N5/445 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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