TRAY, SUBSTRATE PROCESSING APPARATUS USING THE SAME, AND MANUFACTURING METHOD OF TRAY

摘要

PURPOSE: A tray, a substrate processing device using the same, and a method for manufacturing the same are provided to improve durability of the tray against cleaning gas by forming a coating layer on a base plate made of heat resistant materials. CONSTITUTION: A process chamber(210) provides a reaction space for plasma process. A gas spray unit(220) is connected to a gas supply tube(222) which supplies process gas or cleaning gas. A gas supply pipe is electrically connected to an RF power source(224). A plurality of tray transferring rollers(240) are installed on both sidewalls of the process chamber. A substrate holding unit(250) includes a support plate(252) and a shaft(254).