发明名称 DEPOSITION SOURCE, FILM FORMING APPARATUS AND FILM FORMING METHOD
摘要 This invention relates to an evaporation source that elevates material filling density within a material container, a film formation apparatus, and a film formation method. The evaporation source includes: a material container for accommodating organic materials; a heating device for heating the organic materials accommodated in the material container; a pressurizing element that has a plane plate, in which there are a plurality of through holes formed on the plane plate, by means of the pressurizing plane of the plane plate to pressurize the organic materials ma accommodated in the material container, and to make the organic molecules heated and vaporized by the heating device pass the plurality of through holes; and an extension tube that alleviates the pressurizing force of the pressurizing element to the organic materials by means of the elastic force.
申请公布号 KR101149450(B1) 申请公布日期 2012.05.25
申请号 KR20090022100 申请日期 2009.03.16
申请人 发明人
分类号 C23C14/24;C23C14/12;H05B33/10;H05B33/14 主分类号 C23C14/24
代理机构 代理人
主权项
地址