METHOD OF FORMING MICRO-ELECTRO-MECHANICAL-SYSTEM (MEMS) DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a MEMS device.

SOLUTION: The method of forming a MEMS device (10) includes a step of forming a sacrificial layer (34) over a substrate (12). The method further includes a step of forming a metal layer (42) over the sacrificial layer (34) and a step of forming a protection layer (44) overlying the metal layer (42). The method further includes a step of etching the protection layer (44) and the metal layer (42) to form a structure (56) having a remaining portion of the protection layer formed over a remaining portion of the metal layer. The method further includes a step of etching the sacrificial layer (34) to form a movable portion of the MEMS device, wherein the remaining portion of the protection layer protects the remaining portion of the metal layer during the step of etching of the sacrificial layer to form the movable portion of the MEMS device (10).

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