| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist pattern having an excellent shape, and a scum margin, using a substrate having steps. <P>SOLUTION: A radiation sensitive composition includes a polymer component comprising: at least one of a hydroxystyrene structure and a repeating unit which becomes a hydroxystyrene structure by action of an acid from a photoacid generator; and at least one kind selected from repeating units represented by the following general formulas. <P>COPYRIGHT: (C)2012,JPO&INPIT |
