| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer which has excellent transparency to radiation having a wavelength of up to 200 nm and appropriate alkaline hydrolysis properties, permits any kinds of performance of water repellency, water slip properties and surface segregation properties or the like to be adjusted by a choice of its structure, and constitutes water immersion ArF laser exposure lithography materials, for example, such as a photoresist additive or a protective film material. <P>SOLUTION: A specified fluorinated ester-type monomer and a polymer having a repeating unit of the fluorinated ester-type monomer are provided. The polymer has excellent transparency in a broad wavelength range from visible light to 200 nm, and appropriate alkaline hydrolysis properties, and is thus useful as a raw material for opto-functional materials, coating materials or the like, and further especially useful as a polymer constituting water immersion ArF laser exposure lithography materials such as a photoresist additive or a protective film material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
