发明名称 MARKER FOR MEASUREMENT AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a marker for measurement having a position measurement pattern that can be observed from an optional direction without incorporating a light source, and for which the production steps are reduced than before while maintaining manufacturing accuracy of the measurement pattern, and to provide a manufacturing method thereof. <P>SOLUTION: A marker 1A for measurement includes a base material 11, a retroreflective material 10 that is pasted on the base material 11 and retroreflects radiation light l<SB POS="POST">e</SB>, and a transparent base material 12 on which a pattern having a plurality of openings 14 transmitting the radiation light l<SB POS="POST">e</SB>is printed, and which is pasted on the retroreflective material 10. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012098161(A) 申请公布日期 2012.05.24
申请号 JP20100246246 申请日期 2010.11.02
申请人 FUJI XEROX CO LTD 发明人 TANIDA KAZUTOSHI;HOTTA HIROYUKI;SAGUCHI YASUYUKI
分类号 G01B11/00;G01B11/26;G02B5/12 主分类号 G01B11/00
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