发明名称 |
N-TYPE POLYCRYSTALLINE SILICON WAFER, N-TYPE POLYCRYSTALLINE SILICON INGOT AND METHOD OF MANUFACTURING SAME |
摘要 |
PURPOSE: An N type polycrystalline silicon wafer, an N type polycrystalline silicon ingot, and a manufacturing method thereof are provided to improve conversion efficiency by suppressing the potential density of the polycrystalline silicon. CONSTITUTION: An n type polycrystalline silicon ingot is continuously casted by an electromagnetic casting method(S101). A plurality of silicon blocks are separated from the polycrystalline silicon ingot(S102). The silicon block is sliced with a preset thickness(S103). A polycrystalline silicon wafer is completed by controlling the flatness and thickness of a separated surface(S104).
|
申请公布号 |
KR20120052855(A) |
申请公布日期 |
2012.05.24 |
申请号 |
KR20110094407 |
申请日期 |
2011.09.20 |
申请人 |
SUMCO CORPORATION |
发明人 |
SUGIMURA WATARU;KITAMURA TAKAFUMI;YOKOYAMA RYUSUKE |
分类号 |
C30B29/06;C01B33/02;C30B11/00;H01L21/02 |
主分类号 |
C30B29/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|