发明名称 N-TYPE POLYCRYSTALLINE SILICON WAFER, N-TYPE POLYCRYSTALLINE SILICON INGOT AND METHOD OF MANUFACTURING SAME
摘要 PURPOSE: An N type polycrystalline silicon wafer, an N type polycrystalline silicon ingot, and a manufacturing method thereof are provided to improve conversion efficiency by suppressing the potential density of the polycrystalline silicon. CONSTITUTION: An n type polycrystalline silicon ingot is continuously casted by an electromagnetic casting method(S101). A plurality of silicon blocks are separated from the polycrystalline silicon ingot(S102). The silicon block is sliced with a preset thickness(S103). A polycrystalline silicon wafer is completed by controlling the flatness and thickness of a separated surface(S104).
申请公布号 KR20120052855(A) 申请公布日期 2012.05.24
申请号 KR20110094407 申请日期 2011.09.20
申请人 SUMCO CORPORATION 发明人 SUGIMURA WATARU;KITAMURA TAKAFUMI;YOKOYAMA RYUSUKE
分类号 C30B29/06;C01B33/02;C30B11/00;H01L21/02 主分类号 C30B29/06
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