发明名称 NOVEL PHOTOSENSITIVE RESIN COMPOSITION AND UTILIZATION OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in storage stability without decrease in the photosensitivity after long-term storage, excellent in microprocessing properties, developability, low-temperature curability, electric insulation reliability of a cured film, heat resistance against soldering, resistance against organic solvents, flame retardancy and the like. <P>SOLUTION: The photosensitive resin composition comprises at least: an agent (A) containing (a1) a compound having a carboxyl group and no photosensitive group; and an agent (B) containing (b1) an epoxy resin and (b2) an oxime ester photopolymerization initiator. The (b1) epoxy resin is present in a solid state in the agent (B) at room temperature (25&deg;C). <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012098470(A) 申请公布日期 2012.05.24
申请号 JP20100245533 申请日期 2010.11.01
申请人 KANEKA CORP 发明人 KODA TOMOHIRO;SEKITO YOSHIHIDE
分类号 G03F7/027;G03F7/031;H05K3/28 主分类号 G03F7/027
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