LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD

摘要

PURPOSE: A lithography apparatus and a method for cleaning the same are provided to improve cleaning efficiency by including surfactant in cleaning liquid. CONSTITUTION: An illuminator(IL) receives a radiation beam from radiation source(SO). The illuminator includes a controller which controls an angle intensity distribution of the radiation beam. A mask table(MT) supports a mask(MA). A wafer table(WT) holds a substrate(W). A projection system(PS) projects the patterned beam of the radiation on the substrate. A megasonic transducer cleans the surface of a lithography apparatus.