| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microstructure having excellent reflectance, pencil hardness and crack resistance. <P>SOLUTION: (1) There is provided a curable composition for imprint which does not substantially have an alkali developing group but has a polymer (X) with a polymerizable group in the side-chain. (2) There is provided the curable composition for imprint as described in (1), in which the polymerizable group comprises at least one kind selected from vinyl ether group, epoxy group, oxetane group and (meta)acrylate group. (3) There is provided the curable composition for imprint as described in (1), in which the polymer (X) comprises at least one kind selected from repeating units represented by following formulas (Xa)-(Xd). <P>COPYRIGHT: (C)2012,JPO&INPIT |
