| 摘要 |
<P>PROBLEM TO BE SOLVED: To allow a lighting shape and photo mask shape to be optimized even when a photo mask including a plurality of phase differences and a plurality of types of transmittance is used. <P>SOLUTION: A photo mask 200 includes: at least a light transmitting part 204 that transmits exposure light; a semi-translucent part 202 that has lower transmittance of exposure light than that of the light transmitting part 204; a phase shift part 203 that transmits exposure light in a phase different from the light transmitting part 204. In each plurality of division points obtained by dividing the pupil surface of a projection optical system, light intensity distribution of the exposure light transmitted through the photo mask 200 is obtained, and the lighting shape of the exposure light in the exposure using the photo mask 200 is set based on the light intensity distribution. <P>COPYRIGHT: (C)2012,JPO&INPIT |
