| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an extreme ultraviolet (EUV) light generator providing EUV light from a plasma. <P>SOLUTION: A system and a method are provided for protecting an optical element surface of an EUV light source plasma production chamber from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield including at least one hollow tube positioned between an optical element and a plasma formation site is disclosed. The tube is oriented to capture debris while allowing light to pass through a lumen of the tube via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield heated to a temperature sufficient to remove one or more species of a debris material deposited on the shield is disclosed. Furthermore, in another aspect of an embodiment of the present invention, a system in which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned is disclosed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
