发明名称 |
VERTICALLY OSCILLATING DEVICE FOR SUBSTRATE, SUBSTRATE STAGE DEVICE, AND ION IMPLANTATION DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vertically oscillating device for substrate which moves a position in a vacuum chamber; a substrate stage device for reciprocating a substrate in a vertical direction and in a horizontal direction in the vacuum chamber; and an ion implantation device. <P>SOLUTION: The vertically oscillating device for substrate provided in the vacuum chamber 11 comprises: arm parts 33a and 33b which rotate up and down around a rotation axis 37; vertical rails 32a and 32b which are vertically fixed to a main body 31; vertical direction moving members 34a and 34b which move up and down along the vertical rails 32a and 32b; a vertical direction extraction member which extracts a vertical component of a rotation movement of the arm parts 33a and 33b and moves the vertical direction moving members 34a and 34b by an extracted amount of the movement. A substrate holder 21 is provided on one vertical direction moving member 34a and a weight 25 is provided on the other vertical direction moving member 34b. The substrate stage device 30 comprises the vertically oscillating device for substrate and a horizontally oscillating device for substrate which moves the vertically oscillating device for substrate right and left in the vacuum chamber 11. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012099675(A) |
申请公布日期 |
2012.05.24 |
申请号 |
JP20100246855 |
申请日期 |
2010.11.02 |
申请人 |
ULVAC JAPAN LTD;SIGMA TECHNOS KK |
发明人 |
SATO SEIICHI;ITO SHINYA |
分类号 |
H01L21/683;H01J37/317 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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