| 摘要 |
A method and an apparatus of profiling a surface are disclosed. The method comprises projecting slit pattern light toward a target object in at least two directions in sequence to obtain pattern images reflected on the target object, obtaining heights by using the pattern images according to the directions, obtaining vector fields showing a direction of maximum variation of height, obtaining confidence indexes of the heights corresponding to the at least two directions, obtaining integrated vector fields by using the confidence indexes and the vector fields, and calculating height of each position of the target object by using the integrated vector fields. Therefore, accuracy is enhanced.
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