发明名称 4D Process and Structure
摘要 A 4D device comprises a 2D multi-core logic and a 3D memory stack connected through the memory stack sidewall using a fine pitch T&J connection. 3D memory in the stack is thinned from the original wafer thickness to no remaining Si. A tongue and groove device at the memory wafer top and bottom surfaces allows an accurate stack alignment. The memory stack also has micro-channels on the backside to allow fluid cooling, and is further diced at the fixed clock-cycle distance, and flipped on its side and re-assembled on to a template into a pseudo-wafer format. The top side wall of the assembly is polished and built with BEOL to fan-out and use the T&J fine pitch connection to join to the 2D logic wafer. The other side of the memory stack is polished, fanned-out, and bumped with C4 solder. The invention also comprises a process for manufacturing the device.
申请公布号 US2012129276(A1) 申请公布日期 2012.05.24
申请号 US201213353183 申请日期 2012.01.18
申请人 HAENSCH WILFRIED;YU ROY R.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HAENSCH WILFRIED;YU ROY R.
分类号 H01L21/98;H01L21/66 主分类号 H01L21/98
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