发明名称 METHOD AND DEVICE FOR MEASURING IMPURITIES ON SURFACE
摘要 <P>PROBLEM TO BE SOLVED: To accurately measure an impurity concentration by improving a lower limit of detection of impurities at a desired point to be measured. <P>SOLUTION: A method for measuring impurities on a surface includes the following steps: a solvent is dropped on a point to be measured on a surface of an object to be measured 200; a sample solution 300 is prepared while the solvent is held on a solvent holding member (such as a diced base plate 420) for retaining the solvent in place which is placed on a part area of the object to be measured 200; the sample solution 300 is extracted at a solvent extraction part 560; and an impurity analysis of the sample solution 300 is performed. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012098070(A) 申请公布日期 2012.05.24
申请号 JP20100244000 申请日期 2010.10.29
申请人 RENESAS ELECTRONICS CORP 发明人 AOYAGI MICHIKO
分类号 G01N1/28;G01N21/31;G01N30/04;G01N30/88 主分类号 G01N1/28
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