| 摘要 |
PURPOSE: A deposition rate-variable sputtering system by monitoring the temperature in the atmosphere of thin film manufacture is provided to improve the property of a thin film and processes since a temperature monitoring system measures the temperature of a thin film and the atmosphere in the manufacture of the thin film. CONSTITUTION: A deposition rate-variable sputtering system by monitoring the temperature in the atmosphere of thin film manufacture comprises a thin film temperature measuring unit(40), a chamber gas temperature measuring unit(50), and a substrate temperature measuring unit(60). The thin film temperature measuring unit measures the temperature of a thin film(20). The chamber gas temperature measuring unit measures the temperature of residual gas inside a chamber(C). The substrate temperature measuring unit measures the temperature of a substrate(10). A through-hole(41) is formed on one between the top and the bottom of a chamber. A sight glass(42) is formed in order to enable an operator to see the thin film through the through-hole.
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