发明名称 HALOGEN-CONTAINING GAS SUPPLY APPARATUS AND HALOGEN-CONTAINING GAS SUPPLY METHOD
摘要 <P>PROBLEM TO BE SOLVED: To suppress surface corrosion of an introduction valve for introducing halogen-containing gas to an external apparatus and to suppress the degradation of a sealing material used for the introduction valve. <P>SOLUTION: There is provided a halogen-containing gas supply apparatus, which supplies a halogen-containing gas to the external apparatus 100 from a container 1 filled with the halogen-containing gas with high pressure. The halogen-containing gas supply apparatus includes: a supply valve 4 for supplying the halogen-containing gas from the container; and a shock wave preventing mechanism 50, which is provided in the downstream of the supply pipe 4, and which prevents shock waves from being generated. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012097892(A) 申请公布日期 2012.05.24
申请号 JP20110032991 申请日期 2011.02.18
申请人 CENTRAL GLASS CO LTD 发明人 YAO AKIFUMI;UMEZAKI TOMONORI;NAKAHARA KEITA;TAKEDA YUTA
分类号 F17C7/00;F16L55/02;F17C1/10 主分类号 F17C7/00
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