| 摘要 |
A method of validating or verifying a process for cleaning a surface contaminated with at least one chemical substrate, comprising the steps of: capturing an infrared image of the surface using infrared chemical imaging; utilising at least one algorithm to interpret the captured image to extract an infra-red signal from the at least one chemical substrate to determine the amount of the at least one chemical substrate present on the surface; and determining if the amount of the at least one detected chemical substrate exceeds a threshold value, thereby indicating that a repeat cleaning process is required or thereby indicating that no further cleaning is required. |
