发明名称 X-ray Targets and its Fabrication Methods for Generation of Coherent X-rays
摘要 PURPOSE: An X-ray target and its fabrication methods for generation of coherent x-rays are provided to maintain sufficient X-rays photon by forming an X-rays lattice and a target to be one body. CONSTITUTION: A substrate(10) installs to a sputtering device. A buffer layer is formed by evaporating a tungsten thin film(20) by 200 nanometer thickness. The reflecting layer(30) of a lattice is evaporated by 20 nanometer thickness. A beryllium(40) which is used for X-rays transmittance materials is evaporated by 20 nanometer thickness. An X-rays diffraction grating is manufactured by periodically laminating the reflecting layer and the transmission layer.
申请公布号 KR101144748(B1) 申请公布日期 2012.05.24
申请号 KR20090039523 申请日期 2009.05.07
申请人 发明人
分类号 H05G1/00;H05G1/52 主分类号 H05G1/00
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