| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask with higher resolution and higher process capability of circuit implementation by forming a silicone-coating layer on one surface or both surfaces of a glass substrate to reduce the reflectance and increase the transmittance. <P>SOLUTION: A photomask 100 of the present invention includes a glass substrate 110, a chromium layer 120 formed as a light-blocking film on one surface of the glass substrate 110, and a silicone-coating layer 130 formed as a reflection film on one surface of the chromium layer 120. <P>COPYRIGHT: (C)2012,JPO&INPIT |
