发明名称 ULTRA THIN DIE TO IMPROVE SERIES RESISTANCE OF A FET
摘要 A method for producing a power field effect transistor (FET) device having a low series resistance between the drain and source when switched on has the steps of: forming a vertical power FET in a semiconductor die; and back-grinding the semiconductor die to a thickness of less than or equal to about 100 μm (4 mils) or less.
申请公布号 US2012126313(A1) 申请公布日期 2012.05.24
申请号 US201113288219 申请日期 2011.11.03
申请人 BRAITHWAITE ROHAN S.;YACH RANDY L.;JACKSON DANIEL J.;DIX GREGORY;MICROCHIP TECHNOLOGY INCORPORATED 发明人 BRAITHWAITE ROHAN S.;YACH RANDY L.;JACKSON DANIEL J.;DIX GREGORY
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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