| 摘要 |
<p>A substrate drying apparatus is provided with a chamber (21) for drying a resist film formed on a substrate (61) positioned therein, and a transport mechanism (40) having a plurality of rotating rollers (41). The plurality of rotating rollers (41) are positioned at intervals from one another inside the chamber (21), and have the substrate (61) positioned thereon. The transport mechanism (40) transports the substrate (61) with the drive of the rotating rollers (41). While the resist film formed on the substrate (61) is being dried, the rotating rollers (41) are driven in a manner such that the substrate (61) moves back and forth repeatedly inside the chamber (21). As a result, it is possible to provide a substrate drying apparatus and substrate drying method with which uniform liquid film drying is achieved.</p> |
