发明名称 PROXIMITY EXPOSURE DEVICE AND PROXIMITY EXPOSURE METHOD
摘要 <p>An illumination optical system (70) comprises: a light source (73); an integrator (74) which is constructed from a fly eye lens comprising a plurality of lens cells, and makes the intensity of light from the light source (73) uniform; and a movable light occluding member (78) which is provided on the incident surface side of the integrator (74), and occludes light that is incident at any of the plurality of lens cells in such a way that variable setting is performed to a specified collimation half angle. Thus, the collimation half angle is variably set, and a high-resolution pattern having a desired line width can be obtained.</p>
申请公布号 WO2012067246(A1) 申请公布日期 2012.05.24
申请号 WO2011JP76719 申请日期 2011.11.18
申请人 NSK TECHNOLOGY CO., LTD.;TOGASHI TAKUMI;KAWASHIMA HIRONORI 发明人 TOGASHI TAKUMI;KAWASHIMA HIRONORI
分类号 G03F7/20;G02B19/00;H01L21/027 主分类号 G03F7/20
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