| 摘要 |
<p>PURPOSE: A base reactive photoacid generators and photoresists including the same are provided to reduce mask error factors and to improve exposures latitude. CONSTITUTION: Photoacid generating compound is represented by chemical formula I or II. In chemical formula I or II, R1 is C1 to C10 alkyl, C1 to C10 alkyl with hetero elements, C1 to C10 fluoro alkyl, C1 to C10 fluoro alkyl with hetero elements, C6 to C10 aryl, and C6 to C10 aryl; R2 is a chemical bond or a C1 to C30 hydrocarbyl group; R3 is a hydrogen element or a C1 to C30 hydrocarbyl group; C4 is a chemical bon or a C1 to C30 hydrocarbyl group; R5 to R7 respectively are arbitrary substituted carbon cyclic aryl groups, allyl groups, and arbitrary substituted C1 to C20 alkyl groups; X is a chemical bond or a divalent coupling group; Z is beta-hetero element-substituted lactone, acetoacetoxy ester, -C(O)-O-C(O)-R1-, -C(CF3)2O-, -COO-Rf-, -SO3-Rf-, -OCH3-z(CH2OC(=O)-Rf-)z, a base-reactive group containing C5 to C30 cyclohydrocarbyl group; Z1 is a base reactive group; Z2 is beta-hetero element-substituted lactone, -C(O)-O-C(O)-R1-, acetoacetoxyl ester, -COO-Rf-, -SO3-Rf-, -CH3-z(CH2OC(=O)-Rf-)z, base-reactive group containing C5 to C30 cyclohydrocarbyl group; Rf is respectively C1 to C10 fluoro alkyl; and Pg is a polymerizable group.</p> |
