SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition which can obtain a pattern which has outstanding line edge roughness.

SOLUTION: A salt is shown by formula (I), and the resist composition includes the salt. In the formula (I), Q1and Q2independently mutually denote a fluorine atom or a 1-6C perfluoroalkyl group; L1denotes a divalent 1-17C saturated hydrocarbon group, and a methylene group contained in the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; R1denotes a hydroxy group, a 2-7C alkoxycarbonyl group or a 2-7C alkoxycarbonyloxy group; s independently mutually denotes an integer of 1-3; and Z+denotes an organic counter ion.

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