发明名称 |
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK |
摘要 |
According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.
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申请公布号 |
US2012129083(A1) |
申请公布日期 |
2012.05.24 |
申请号 |
US201113300722 |
申请日期 |
2011.11.21 |
申请人 |
YOSHIMORI TOMOAKI;KARYU MAKOTO;MOTOKAWA TAKEHARU;TAKAI KOSUKE;KASE YOSHIHISA;KABUSHIKI KAISHA TOSHIBA;SHIBAURA MECHATRONICS CORPORATION |
发明人 |
YOSHIMORI TOMOAKI;KARYU MAKOTO;MOTOKAWA TAKEHARU;TAKAI KOSUKE;KASE YOSHIHISA |
分类号 |
G03F1/24;G03B27/42 |
主分类号 |
G03F1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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