| 摘要 |
Stereolithography machine (1) comprising: a supporting frame (2); a tank (3) suited to contain a liquid substance; a supporting plate (4) associated with the supporting frame (2), suited to support the tank (3); a stopping unit (5) suited to firmly hold the tank (3) on the supporting plate (4) in a resting position; emitter means (6) suited to direct a predefined electromagnetic radiation (6a) towards the tank (3); a holding unit (7) of the tank (3) operatively associated with the supporting plate (4) through first actuator means (8) configured so as to move the tank (3) with respect to the supporting plate (4) according to a predefined trajectory of movement. The stopping unit (5) comprises second actuator means (17) that define for the stopping unit (5) an active configuration for holding the tank (3) and a rest configuration for releasing the tank (3). |
