发明名称 PLASMA PROCESSING EQUIPMENT WITH A LEAKAGE CURRENT TRANSFORMER
摘要 Provided is a plasma treatment apparatus using a leakage current transformer, the apparatus, including: a chamber which provides a closed space in which plasma is formed, and receives a treated sample in an inner part thereof; an exhaust unit for forming the inner part of the chamber in a vacuum state; plasma generation electrodes fixed in the chamber, positive and negative poles of which are installed to be opposed to each other; a variable power supply which is installed in an outer part of the chamber and supplies a power source to the plasma generation electrodes; and a leakage current transformer which is installed between the variable power supply and the plasma generation electrodes and adjusts voltage and current applied to the plasma generation electrodes.
申请公布号 KR101147349(B1) 申请公布日期 2012.05.23
申请号 KR20100091544 申请日期 2010.09.17
申请人 发明人
分类号 H05H1/24;H01L21/205;H01L21/3065 主分类号 H05H1/24
代理机构 代理人
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