发明名称 A pellicle for lithography
摘要 There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer has a facial flatness of 15 micrometers or smaller: for the purpose of better preventing the pellicle frame from affecting the mask to deform.
申请公布号 EP2455809(A2) 申请公布日期 2012.05.23
申请号 EP20110358012 申请日期 2011.11.15
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SHIRASAKI, TORU
分类号 G03F1/62;G03F1/64 主分类号 G03F1/62
代理机构 代理人
主权项
地址