发明名称 Solid state imaging device comprising charge retention region and buried layer below gate
摘要 A solid state imaging device, includes: a sensor cell array having a plurality of sensor cells arranged in a matrix on a substrate, each sensor cell including: a photoelectric transducer provided in the substrate and generating photo-generated electric charges according to an incident light; a transfer gate formed on the substrate with a gate insulating layer therebetween; a charge retention region formed under the gate insulating layer and storing the photo-generated electric charges that are transferred from the photoelectric transducer by applying a predetermined potential to the transfer gate; a buried layer formed between the charge retention region and the gate insulating layer; and a floating diffusion storing the photo-generated electric charges that are transferred from the charge retention region by applying a predetermined potential to the transfer gate.
申请公布号 US8183657(B2) 申请公布日期 2012.05.22
申请号 US20050227022 申请日期 2005.09.15
申请人 KUWAZAWA KAZUNOBU;SEIKO EPSON CORPORATION 发明人 KUWAZAWA KAZUNOBU
分类号 H01L31/0352;H01L27/146;H04N5/335;H04N5/361;H04N5/369;H04N5/372 主分类号 H01L31/0352
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