发明名称 Multi-beam source
摘要 A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.
申请公布号 US8183543(B2) 申请公布日期 2012.05.22
申请号 US20080178153 申请日期 2008.07.23
申请人 PLATZGUMMER ELMAR;IMS NANOFABRICATION AG 发明人 PLATZGUMMER ELMAR
分类号 A61N5/00;G21G5/00 主分类号 A61N5/00
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