发明名称 Semiconductor device
摘要 A falling off of a through electrode is inhibited without decreasing a reliability of a semiconductor device including a through electrode. A semiconductor device 100 includes: a silicon substrate 101; a through electrode 129 extending through the silicon substrate 101; and a first insulating ring 130 provided in a circumference of a side surface of the through electrode 129 and extending through the semiconductor substrate 101. In addition, the semiconductor device 100 also includes a protruding portion 146, being provided at least in the vicinity of a back surface of a device-forming surface of the semiconductor substrate 101 so as to contact with the through electrode 129, and protruding in a direction along the surface of the semiconductor substrate 101 toward an interior of the through electrode 129.
申请公布号 US8183685(B2) 申请公布日期 2012.05.22
申请号 US20110986716 申请日期 2011.01.07
申请人 KAWANO MASAYA;SOEJIMA KOJI;TAKAHASHI NOBUAKI;RENESAS ELECTRONICS CORPORATION 发明人 KAWANO MASAYA;SOEJIMA KOJI;TAKAHASHI NOBUAKI
分类号 H01L23/04;H01L23/48 主分类号 H01L23/04
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