发明名称 |
COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING |
摘要 |
According to the present invention a composition is provided comprising at least one source of metal ions and at least one additive obtainable by reacting a) a polyhydric alcohol condensate compound derived from at least one polyalcohol of formula (I) X(OH)n (I) by condensation with b) at least one alkylene oxide to form a polyhydric alcohol condensate comprising polyoxyalkylene side chains, wherein n is an integer from 3 to 6 and X is an n-valent linear or branched aliphatic or cycloaliphatic radical having from 2 to 10 carbon atoms, which may be substituted or unsubstituted. |
申请公布号 |
KR20120051721(A) |
申请公布日期 |
2012.05.22 |
申请号 |
KR20127004870 |
申请日期 |
2010.07.16 |
申请人 |
BASF SE |
发明人 |
ROEGER GOEPFERT CORNELIA;RAETHER ROMAN BENEDIKT;HAAG ALEXANDRA;MAYER DIETER;EMNET CHARLOTTE |
分类号 |
C25D3/02;C25D3/38;H01L21/768;H05K3/42 |
主分类号 |
C25D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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