| 摘要 |
<p>The invention relates to a patterning device (10, 12) for generating a pattern (20, 22, 24) in and/or on a layer (32, 34) via a condensed light beam (40). The patterning device comprises a light source (50) for generating the condensed light beam (40), a diffractive optical element (60) for splitting the condensed light beam (40) into a plurality of condensed sub-beams (40A, 40B, 40C) and positioning means (70) for positioning the layer relative to the plurality of condensed sub-beams for generating the pattern. The condensed sub-beams are configured for generating the pattern in and/or on the layer. At least two sub-beams of the plurality of condensed sub-beams comprise substantially equal intensity. An effect of the patterning device according to the invention is that a single condensed light beam is split into a plurality of condensed sub-beams to generate a multi-spot patterning for patterning relatively large areas using the plurality of condensed sub-beams. As such, the patterning time for filling that area in the pattern and for generating the pattern in and/or on the layer is considerably reduced.</p> |
