| 摘要 |
The present invention provides a method for determining a substrate position in a proximity exposure apparatus, wherein a plurality of laser displacement meters are used for detecting the inclination of a chuck plate in a theta direction with excellent precision for positioning the substrate in the theta direction with excellent precision. A movable platform which carries the chuck plate for movement comprises the following components: a first platform which moves in an X direction (or Y direction); a second platform which is carried on the first platform and moves in the Y direction (or X direction); and a third platform which is carried on the second platform and rotates in the theta direction. The second platform is provided with the plurality of laser displacement meters. The plurality of laser displacement meters and the chuck plate are moved together in the X direction and the Y direction. Furthermore the displacement of the chuck place is measured through the plurality of laser displacement meters. The inclination of the chuck plate in the theta direction is detected according to the measurement result. Furthermore the chuck plate is rotated in the theta direction through the third platform according to the detection result for positioning the substrate in the theta direction.
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