EXPOSURE DEVICE

摘要

The present invention comprises: a conveying means (1) that conveys an object to be exposed (4) in a fixed direction at a fixed speed; a pattern generator (6) that projects a laser light (L) that is spread in one direction and split into a plurality of laser beams (Lb) that are arranged in a row at a fixed arrangement pitch by a plurality of light switches that are arranged in a row at a fixed arrangement pitch in a direction that intersects with the conveying direction of the object to be exposed (4); a light scanning means (7) that simultaneously reciprocally scans a region between a laser beam (Lb) conjoining the plurality of laser beams (Lb) that project from the pattern generator (6) and illuminate onto the object to be exposed (4); an f? lens (8) that focuses the reciprocally scanned plurality of laser beams (Lb) onto the object to be exposed; and a control means (3) that controls the on/off power of the plurality of light switches of the pattern generator (6). Accordingly, the scanning distance of the light beam that is scanned onto the object to be exposed is shortened and the tact of the exposure process is reduced.