发明名称 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION
摘要 <p>The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation (100), for example part of the floor in the room where the lithography system is arranged, and a method for arranging a lithography system on a foundation. The lithography system is arranged on top of a rigid or solid base plate (110), wherein said base plate having one or more struts (150) attached thereto for placing the lithography system onto the foundation, wherein the one or more strutsare arranged at a side of the base plate facing the foundation, and wherein the base plate is provided with a cut-out or an opening for mounting equipment (330) underneath a vacuum chamber of the lithography system.</p>
申请公布号 WO2012039606(A4) 申请公布日期 2012.05.18
申请号 WO2011NL50630 申请日期 2011.09.20
申请人 MAPPER LITHOGRAPHY IP B.V.;PEIJSTER, JERRY 发明人 PEIJSTER, JERRY
分类号 G03F7/20;F16F15/04 主分类号 G03F7/20
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