发明名称 ION IMPLANTATION TOOL CLEANING APPARATUS AND METHOD
摘要 PURPOSE: An ion implantation tool cleaning device and method are provided to eliminate residues by distributing cleaning agent to an ion impregnator or an element. CONSTITUTION: One or more cleaning agent feed vessels(16) are structurally combined with housing. A cleaning agent flow circuit(18) is combined with the one or more cleaning agent feed vessels. A depletion-detection system determines a depletion state of the cleaning agent feed vessel which is predetermined. A processor and controller configuration element assembly(144) passes through cleaning agent of the one or more cleaning agent feed vessels through the cleaning agent flow circuit. The processor and controller configuration element assembly distributes the cleaning agent to an ion impregnator or an element.
申请公布号 KR20120050396(A) 申请公布日期 2012.05.18
申请号 KR20110117199 申请日期 2011.11.10
申请人 ADVANCED TECHNOLOGY MATERIALS INC. 发明人 DESPRES JOSEPH R.;MCMANUS JAMES V.;CHISM RICHARD D.;JONES EDWARD E.;SWEENEY JOSEPH D.;SERGI STEVEN G.;TANG YING;WODJENSKI MICHAEL J.;RAY RICHARD S.;CHAMBERS. BARRY LEWIS
分类号 H01J37/317;B08B5/00;B08B7/00 主分类号 H01J37/317
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