| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide technique capable of realizing a flow sensor with high sensitivity, by forming a metal film having relatively high TCR via an insulating film on a semiconductor substrate. <P>SOLUTION: A measuring element of a thermal type fluid flow sensor comprises: a heating resistor 3 constituted of a first metal film; a temperature detecting resistor (an upstream temperature detecting resistor 4a and a downstream temperature detecting resistor 4b); and an air temperature detecting resistor 5. The first metal film is formed of an α-Ta film having resistance of three times or less of that of a Ta ingot obtained with deposition by a spattering method on an amorphous film 9 containing metal. <P>COPYRIGHT: (C)2012,JPO&INPIT |
