| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem that when measuring a pattern having large process variation, correct measurement cannot be performed if noise such as a pattern other than a measurement target and dust exists in the periphery of a measurement target pattern in a previously registered measurement area. <P>SOLUTION: A predetermined area positioned by performing pattern matching in image data of a sample is set as non-measurement target area to be excluded from a pattern measurement target. For instance, when measuring a pattern having large process variation, only an area including a pattern having small process variation is used for the pattern matching, and in pattern measurement, a predetermined positioned area used for the pattern matching is set as a non-measurement target area. Consequently, easy and stable pattern measurement can be applied also to a pattern having large process variation without being influenced by an area on which the measurement area and the non-measurement target area are overlapped to each other. <P>COPYRIGHT: (C)2012,JPO&INPIT |
