发明名称 PROCESS AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 The process for manufacturing the semiconductor device and the apparatus, which achieve stable production of semiconductor devices with improved connection reliability, is presented. First terminals of circuit boards 1 are arranged to face the corresponding bumps of semiconductor chips 2, respectively, and the resin layer 3 is disposed between the respective first terminals and the respective bumps to form laminates, and the laminates are simultaneously compressed from a direction of lamination, while heating a plurality of laminates. In such case, the diaphragm 54 disposed in a heating furnace 51 is abutted against a plurality of laminates or a member 531 to elastically deform the members while a plurality of laminates is heated in the heating furnace 51, so that laminates are simultaneously compressed from a direction of lamination, while heating thereof in a vacuum.
申请公布号 US2012118939(A1) 申请公布日期 2012.05.17
申请号 US201113295581 申请日期 2011.11.14
申请人 KUSANAGI KEIYO;HATAKEYAMA KOICHI;WATANABE MITSUHISA;NAKANOYA YUSUKE;MATSUSHITA HIDENORI;MEURA TORU;MAEJIMA KENZOU;NIKAIDO HIROKI;NIKAIDO MINA;SUMITOMO BAKELITE CO., LTD.;ELPIDA MEMORY, INC. 发明人 KUSANAGI KEIYO;HATAKEYAMA KOICHI;WATANABE MITSUHISA;NAKANOYA YUSUKE;MATSUSHITA HIDENORI;MEURA TORU;MAEJIMA KENZOU;NIKAIDO HIROKI;NIKAIDO MINA
分类号 B23K1/008;B23K31/02 主分类号 B23K1/008
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