发明名称 |
DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD |
摘要 |
<p>PURPOSE: A deflector array, a charged particle beam drawing apparatus, a device manufacturing method, and a method for manufacturing the deflector array are provided to improve a manufacturing yield by preparing a partitioned deflector chip. CONSTITUTION: A base substrate(207) includes a plurality of openings. A plurality of deflector chips(116) includes the plurality of openings. The plurality of deflector chips includes a plurality of electrode pairs. The electrode pairs are arranged on both sides of at least some openings of the openings on the deflector chips. The plurality of deflector chips is fixed to the base substrate.</p> |
申请公布号 |
KR20120049821(A) |
申请公布日期 |
2012.05.17 |
申请号 |
KR20110115598 |
申请日期 |
2011.11.08 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAMAZAKI TORU;KUWABARA MASAMICHI;HIRATA YOSHIHIRO |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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