| 摘要 |
<P>PROBLEM TO BE SOLVED: To protect an immersion fluid from an atmospheric environment in an immersion lithographic apparatus. <P>SOLUTION: A lithographic apparatus is disclosed in which a liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus and which has a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered in the liquid during exposure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
